Lateral power diode with self-biasing electrode

ABSTRACT

A schottky diode includes a drift region of a first conductivity type and a lightly doped silicon region of the first conductivity type in the drift region. A conductor layer is over and in contact with the lightly doped silicon region to form a schottky contact with the lightly doped silicon region. A highly doped silicon region of the first conductivity type is in the drift region and is laterally spaced from the lightly doped silicon region such that upon biasing the schottky diode in a conducting state, a current flows laterally between the lightly doped silicon region and the highly doped silicon region through the drift region. A plurality of trenches extend into the drift region perpendicular to the current flow. Each trench has a dielectric layer lining at least a portion of the trench sidewalls and at least one conductive electrode.

CROSS-REFERENCES TO RELATED APPLICATIONS

This application is a division of U.S. application Ser. No. 12/344,063,filed Dec. 24, 2008, which is a continuation of U.S. application Ser.No. 11/404,062, filed Apr. 12, 2006, which claims the benefit of U.S.Provisional Application No. 60/774,900, filed Feb. 16, 2006. The priorapplications are incorporated herein by reference in their entirety forall purposes.

U.S. application Ser. No. 10/269,126, filed Oct. 3, 2002, and U.S.application Ser. No. 10/951,259, filed Sep. 26, 2004, are alsoincorporated herein by reference in their entirety for all purposes.

BACKGROUND OF THE INVENTION

The present invention relates to semiconductor power devices, and moreparticularly to lateral power devices with self-biasing electrodesintegrated therein. FIG. 1 shows a cross section view of a conventionallateral MOSFET 100. A lightly doped N-type drift region 104 extends overa highly doped N-type region 102. A P-type body region 106 and a highlydope N-type drain region 114 separated from each other by alaterally-extending N-type lightly doped drain (LDD) region are allformed in drift region 104. Highly doped N-type source region 110 isformed in body region 106, and heavy body region 108 is formed in bodyregion 106. A gate 118 extends over a surface of body region 106 andoverlaps source region 110 and LDD region 112. Gate 118 is insulatedfrom its underlying regions by a gate insulator 116. The portion of bodyregion 106 directly beneath gate 118 forms the MOSFET channel region120.

During operation, when MOSFET 100 is biased in the on state, currentflows laterally from source region 110 to drain region 114 throughchannel region 120 and LDD region 112. As with most conventionalMOSFETs, performance improvements of lateral MOSFET 100 is limited bythe competing goals of achieving higher blocking capability and loweron-resistance (Rdson). While LDD region 112 results in improved Rdson,this improvement is limited by the blocking capability of thetransistor. For example, the doping concentration of LDD region 112 andthe depth to which it can be extended are both severely limited by thetransistor breakdown voltage.

These impediments to performance improvements are also present in othertypes of lateral power devices such as lateral IGBTs, lateral pn diodes,and lateral Schottky diodes. Thus, there is a need for a techniquewhereby the blocking capability, the on-resistance, as well as otherperformance parameters of various types of lateral power devices can beimproved.

BRIEF SUMMARY OF THE INVENTION

In accordance with an embodiment of the invention, a semiconductor diodeincludes a drift region of a first conductivity type and an anode regionof a second conductivity type in the drift region such that the anoderegion and the drift region form a pn junction therebetween. A firsthighly doped silicon region of the first conductivity type is in thedrift region, and is laterally spaced from the anode region such thatupon biasing the semiconductor power diode in a conducting state, acurrent flows laterally between the anode region and the first highlydoped silicon region through the drift region. Each of a plurality oftrenches extending into the drift region perpendicular to the currentflow includes a dielectric layer lining at least a portion of the trenchsidewalls and at least one conductive electrode.

In accordance with another embodiment of the invention, a schottky diodeincludes a drift region of a first conductivity type and a lightly dopedsilicon region of the first conductivity type in the drift region. Aconductor layer extends over and contacts the lightly doped siliconregion to form a schottky contact therebetween. A highly doped siliconregion of the first conductivity type in the drift region is laterallyspaced from the lightly doped silicon region such that upon biasing theschottky diode in a conducting state, a current flows laterally betweenthe lightly doped silicon region and the highly doped silicon regionthrough the drift region. Each of a plurality of trenches extending intothe drift region perpendicular to the current flow includes a dielectriclayer lining at least a portion of the trench sidewalls and at least oneconductive electrode.

In accordance with yet another embodiment of the invention, asemiconductor diode is formed as follows. An anode region is formed in adrift region so as to form a pn junction therebetween. The drift regionis of first conductivity type, and the anode region is of a secondconductivity type. A first highly doped silicon region of the firstconductivity type is formed in the drift region. The first highly dopedsilicon region is laterally spaced from the anode region such that uponbiasing the semiconductor power diode in a conducting state, a currentflows laterally between the anode region and the first highly dopedsilicon region through the drift region.

In accordance with still another embodiment of the invention, a schottkydiode is formed as follows. A lightly doped silicon region of a firstconductivity type is formed in a drift region of the first conductivitytype. A conductor layer is formed extending over and in contact with thelightly doped silicon region so as to form a schottky contacttherebetween. A highly doped silicon region of the first conductivitytype is formed in the drift region. The highly doped silicon region islaterally spaced from the lightly doped silicon region such that uponbiasing the schottky diode in a conducting state, a current flowslaterally between the lightly doped silicon region and the highly dopedsilicon region through the drift region. A plurality of trenchesextending into the drift region perpendicular to the current flow isformed. A dielectric layer lining at least a portion of the trenchsidewalls is formed. At least one conductive electrode is formed in eachtrench.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a simplified cross section view of a conventional lateralMOSFET 100;

FIGS. 2 and 3 show simplified cross section views of lateral MOSFETstructures with two different self-biasing electrode structuresintegrated therein, in accordance with exemplary embodiments of theinvention;

FIGS. 4 and 5 are simulation results respectively showing the electricfield distribution in the drift region for the conventional MOSFET inFIG. 1 and the exemplary MOSFET embodiment shown in FIG. 3;

FIGS. 6-16 show simplified isometric views of various lateral powerdevice structures with self-biasing electrode structures integratedtherein, in accordance with other exemplary embodiments of theinvention; and

FIGS. 17A-17C show top layout views of three exemplary configurations ofthe self-biasing electrodes, in accordance with embodiments of theinvention.

DETAILED DESCRIPTION OF THE INVENTION

In accordance with the invention, self-biasing electrodes are integratedin various lateral power devices such that the electric fileddistribution in the blocking layer of these devices is altered so as toimprove the device blocking capability for the same doping concentrationof the blocking layer. Alternatively, the self-biasing electrodes enableuse of higher doping concentration in the blocking layer for the sameblocking capability, whereby the device on-resistance and powerconsumption are improved.

FIG. 2 shows a simplified cross section view of a planar-gate lateralMOSFET 200 with self-biasing electrodes, in accordance with an exemplaryembodiment of the invention. A lightly doped N-type drift region 204extends over a highly doped N-type semiconductor region 202. In oneembodiment, both drift region 204 and its underlying highly dopedsemiconductor region 202 are epitaxial layers. In another embodiment,drift region 204 is an epitaxial layer and highly doped semiconductorregion 202 is an N+ substrate. In yet another embodiment, drift region204 is formed by implanting and driving dopants into highly doped region202 which itself can be an epitaxial layer or a substrate.

A P-type body region 206 and a highly dope N-type drain region 214 arelocated in an upper portion of drift region 204. Body region 206 anddrain region 214 are laterally spaced from one another as shown. Highlydoped N-type source region 210 is located in an upper part of bodyregion 206, and heavy body contact region 208 is located in body region206 adjacent source region 210. A gate 218 extends over a surface ofbody region 206 and overlaps source region 210 and drift region 204.Gate 218 is insulated from its underlying regions by a gate insulator216. The portion of body region 206 directly beneath gate 218 forms theMOSFET channel region 220. A source conductor (not shown) electricallycontacts source region 210 and heavy body region 208, and a drainconductor (also not shown) electrically contacts drain region 214. Thesource and drain conductors may be from metal.

Trenches 222 extend in drift region 204 to a predetermined depth. Aninsulating layer 226 lines the trench bottom and the trench sidewallsexcept for upper sidewall portions 228. A T-shaped conductive electrode224 fills each trench 222 and electrically contacts drift region 204along the upper trench sidewall portions 228, as shown. In oneembodiment, conductive electrode 224 is of opposite conductivity to thatof drift region 204, and is thus P-type given the N-type conductivity ofdrift region 204. In another embodiment, conductive electrode 224comprises one of highly doped P-type polysilicon, doped silicon andmetal.

The presence of dielectric layer 226 advantageously eliminates the needfor careful control of the doping of electrode 224 which would otherwisebe required to ensure charge balance. Also, in the embodiment whereinelectrode 224 comprises doped silicon, dielectric layer 226 prevents thedopants in the doped silicon from out-diffusing.

A method of manufacturing MOSFET 200, in accordance with an embodimentof the invention, is as follows. Gate dielectric 216 and gate electrode218 are formed over drift region 204 using conventional techniques. Bodyregion 206, source region 210, drain region 214 and heavy body region208 are formed in drift region 204 using conventional masking andimplant/drive-in techniques. Note that source region 210 and body region208 are self-aligned to the edge of gate electrode 218. The variousmetal layers (e.g., source and drain metal layers) and dielectric layersnot shown are formed using known techniques. Trenches 222 are formed indrift region 204 using conventional masking and silicon etch techniques.A dielectric layer 226 is then formed to line the trench sidewalls andbottom. In one embodiment, dielectric layer 226 has a thickness in therange of 100-500 Å. One factor in determining the thickness ofdielectric layer 226 is the doping concentration of drift region 204.For a drift region with higher doping concentration, a thinnerdielectric layer 226 may be used.

A layer of polysilicon is then deposited and etched back such thattrenches 222 are filled with polysilicon having a top surface that iscoplanar with the adjacent mesa surfaces. The polysilicon in each trenchis slightly recessed so that portions of dielectric layer 226 alongupper trench sidewalls are exposed. The exposed portions of layer 226are the removed so that drift region 204 along the upper trenchsidewalls becomes exposed. A second polysilicon deposition and etch backis carried out to fill the upper portion of each trench, therebyelectrically shorting the polysilicon electrode in each trench to thedrift region.

The process steps for forming the self-biasing electrodes may be carriedout at various stages of the process depending on the manufacturingtechnology, the material used for various layers and other process anddesign constraints. For example, if electrodes 224 comprise polysilicon,the steps for forming the trenched electrodes may be carried out earlyin the process since polysilicon can withstand high temperatures.However, if electrodes 224 comprise metal, then the steps for formingthe trenched electrodes need to be carried out later in themanufacturing process after the high temperature processes have beencarried out.

FIG. 3 shows an alternate self-biasing electrode structure/techniqueintegrated with a MOSFET 300, in accordance with another exemplaryembodiment of the invention. In FIG. 3, electrodes 324 in trenches 322make electrical contact with drift region 304 along the bottom region328 of trenches 322 rather than along the top of the trenches as inMOSFET 200. The manufacturing process for forming MOSFET 300 is similarto that for MOSFET 200 described above except for the process stepsassociated with forming the trenched electrode structure which isdescribed next.

Trenches 322 are formed in drift region 304 using conventional maskingand silicon etch techniques. Although trenches 322 may be furtherextended to terminate in the highly doped region 302, terminatingtrenches 322 in drift region 304 is more advantageous since the lowerdoping of drift region 304 facilitates the self-biasing of electrodes324. This is described in more detail further below. Next, a dielectriclayer 326 lining the trench sidewalls and bottom is formed usingconventional techniques. Next, a directional etch of dielectric layer326 removes only the horizontally extending portions of dielectric layer326. Drift region 304 thus becomes exposed along the bottom region 328of trenches 322. A conductive electrode, such as in-situ doped (P-type)polysilicon is formed and then recessed into trenches 322. Anotherdielectric layer is then formed over electrodes 324 to seal off trenches322. Electrodes 328 are thus in electrical contact with drift region 304along the trench bottom regions 328.

The electrical connection between P-type electrodes 224 and N-type driftregion 204 in MOSFET 200, and between P-type electrodes 324 and N-typedrift region 304 in MOSFET 300 result in electrodes 224 and 324self-biasing to a voltage greater than zero. In one embodiment, thedoping polarity of all regions in MOSFETs 200 and 300 are reversed thusforming P-channel MOSFETs. In this embodiment, the electrical connectionbetween the P-type drift region and the N-type trenched electrodesresult in the electrodes self-biasing to a voltage less than zero.

The self-biasing electrodes serve to alter the electric field in thedrift region as illustrated by the simulation results in FIGS. 4 and 5.FIG. 4 shows the electric field distribution in drift region 104 of theconventional MOSFET 100 in FIG. 1. As can be seen, the electric fieldpeaks near the curvature of body region 106, and then tapers off towardsthe drain region thus forming a triangular area under the electric fieldcurve. FIG. 5 shows the electric field distribution in drift region 304of MOSFET 300 in FIG. 3. As can be seen, other than the peak at thecurvature of body region 306, two additional peaks are induced by thetwo self-biasing electrodes 324. As a result, the area under theelectric field curve is increased which in turn increases the transistorbreakdown voltage. As indicated in FIGS. 4 and 5, the breakdown voltageis improved from 75V for the prior art MOSFET 100 to 125V for MOSFET 300for the same drift region doping concentration of 5×10¹⁵/cm³. Thisamounts to a 66% improvement in the breakdown voltage.

FIG. 6 shows a simplified isometric view of a MOSFET 600 wherein variouslayers are peeled back to reveal the underlying regions, in accordancewith an embodiment of the invention. MOSFET 600 is similar to MOSFET 300except for few features that are described further below. The FIG. 6isometric view shows one of many possible placement patterns for theself-biasing electrodes in drift region 604. As can be seen, theself-biasing electrodes are arranged in a staggered configuration, butmany other configurations can also be envisioned by one skilled in thisart. In one embodiment, the location and number of electrodes is to someextent dependent on the doping concentration of drift region 604. Thehigher the doping concentration of drift region 604, the more electrodescan be placed in the drift region and thus a higher breakdown voltage isobtained. Also, the number of electrodes may be limited by the currentdensity requirements of the device.

In an alternate embodiment, an LDD region similar to LDD region 112 inthe conventional MOSFET 100 is incorporated in MOSFET 600. Such LDDregion would have a higher doping concentration than drift region 604 inwhich it is formed, and thus allows a higher number of self-biasingelectrodes be included in the drift region if desired. The LDD regiontogether with the increased number of self-biasing electrodessignificantly reduces the device on-resistance and increase thebreakdown voltage.

FIG. 6 also shows a source conductor 632 (e.g., comprising metal)electrically contacting source region 610 and heavy body region 608, anda drain conductor 634 (e.g., comprising metal) electrically contactingdrain region 614, with dielectric layer 630 insulating source conductor632, gate 618 and drain conductor 634 from one another. As shown,trenched electrodes 624 terminate at the upper surface of drift region604 so that dielectric layer 630 fully covers electrodes 624. In anotherembodiment, electrodes 624 are recessed in their respective trenchessimilar to electrodes 324 in MOSFET 300.

MOSFET 600 differs from MOSFET 300 in a number of respects. Drift region604 is higher doped than drift region 304 in FIG. 3, and extends over alower doped silicon region 602 rather than a higher doped silicon regionas in MOSFET 300. The higher doping of drift region 604 results in lowerconduction resistance through the drift region, and thus a loweron-resistance. The higher doping concentration of the drift region ismade possible by the improved blocking capability brought about by theself-biasing electrodes.

Another distinction between MOSFETs 600 and 300 is that in MOSFET 600trenched electrodes 624 extend clear through drift region 604 andterminate in lower doped silicon region 602. This results in electrodes624 coming in contact with lower doped silicon region 602 instead ofdrift region 604. This is advantageous in that by contacting the lowerdoped region 602 (as opposed to the higher doped drift region 604),electrodes 624 can self-bias rather than attain the potential of thesilicon region which would be the case if they contacted higher dopedsilicon regions.

FIG. 7 shows a simplified isometric view of a lateral insulated gatebipolar transistor (IGBT) 700 with integrated self-biasing electrodes,in accordance with an exemplary embodiment of the invention. An N-typedrift region 704 extends over a lightly doped N-type region 702. In oneembodiment, both drift region 704 and the lightly doped region 702 areepitaxial layers. In another embodiment, drift region 704 is anepitaxial layer and lightly doped region 702 is an N− substrate. In yetanother embodiment, drift region 704 is formed by implanting and drivingdopants into lightly doped region 702 which itself can be an epitaxiallayer or a substrate.

A P-type body region 706 and a highly dope P-type collector region 714are located in an upper portion of drift region 704. Body region 706 andcollector region 714 are laterally spaced from one another as shown.Highly doped N-type emitter region 710 is formed in body region 706, andheavy body contact region 708 is formed in body region 706. A gate 718(e.g., comprising polysilicon) extends over a surface of body region 706and overlaps emitter region 710 and drift region 704. Gate 718 isinsulated from its underlying regions by a gate insulator 716. Theportion of body region 706 directly beneath gate 718 forms the IGBTchannel region 720. An emitter conductor 732 (e.g., comprising metal)electrically contacts emitter region 710 and heavy body region 708, anda collector conductor 734 electrically contacts collector region 714.Dielectric layer 730 insulates emitter conductor 732, gate 718 and drainconductor 734 from one another.

Trenches 722 extend through drift region 704 and terminate in siliconregion 702. An insulating layer 726 lines the trench sidewalls but notthe trench bottom. A conductive electrode 724 fills each trench 722 andelectrically contacts silicon region 702 along the trench bottom region728. In one embodiment, conductive electrode 724 is of oppositeconductivity to that of silicon region 702, and is thus P-type given theN-type conductivity of silicon region 702. In another embodiment,conductive electrode 724 comprises a highly doped P-type polysilicon ordoped silicon or metal.

Many of the considerations referred to in connection with the precedingembodiments, such as placement and frequency of the electrodes versusthe doping concentration of the drift region also apply to IGBT 700though operational differences (e.g., both hole current and electroncurrent contribute to current conduction in IGBTs) need to be taken intoaccount.

FIG. 8 shows a simplified isometric view of a lateral diode 800 withintegrated self-biasing electrodes, in accordance with another exemplaryembodiment of the invention. An N-type drift region 804 extends over alightly doped N-type region 802. As in previous embodiments, siliconregion 802 may be an epitaxial layer or a substrate, and drift region804 may be an epitaxial layer or may be formed by implanting and drivingdopants into silicon region 802.

A P-type anode region 806 and a highly doped N-type (N+) region 814 areformed in drift region 804. Anode region 806 and N+ region 814 arelaterally spaced from one another as shown. An anode conductor layer 832(e.g., comprising metal) electrically contacts anode region 806, and acathode conductor layer 834 (e.g., comprising metal) electricallycontacts N+ region 814. Dielectric layer 830 insulates anode conductorlayer 832 and cathode conductor layer 834 from one another. Trenchedelectrodes 824 have similar structure to those in FIGS. 6 and 7, andthus will not be described. As in the previous embodiments, self-biasingelectrodes 824 serve to improve the blocking capability of diode 800 forthe same drift region doping concentration.

FIG. 9 shows a simplified isometric view of a lateral schottky diode 900with integrated self-biasing electrodes, in accordance with anotherexemplary embodiment of the invention. The structure of lateral schottkydiode 900 is, for the most part, similar to diode 800; however, insteadof P-type anode region 806, a shallow lightly doped N-type region 906 isformed in drift region 904. Anode conductor 932 (e.g., comprising aschottky barrier metal) forms a schottky contact with the shallow N-typeregion 906. In one variation, a shallow P-type region is formed in placeof N-type region 906, whereby anode conductor 932 forms a schottkycontact with the P-type region. As in the previous embodiments,self-biasing electrodes 924 serve to improve the blocking capability ofschottky diode 900 for the same drift region doping concentration.

FIG. 10 shows a simplified isometric view of a variation of the lateralMOSFET 600 wherein a drain plug 1034 (e.g., comprising metal) extendsdeep into drift region 1004. In one embodiment, drain plug 1034 extendsto approximately the same depth as electrode trenches 1022. Thisembodiment is advantageous in that drain plug 1034 serves to spread thecurrent through drift region 1004 thereby further reducing the MOSFETon-resistance. This coupled with the self-biasing electrodessignificantly reduce the transistor on-resistance and power consumption.

FIG. 11 shows a simplified isometric view of a variation of the lateralMOSFET 1000 wherein in addition to a drain plug 1134, a highly dopedN-type drain region 1114 surrounding the drain plug 1134 is incorporatedin the structure. Drain region 1114 further reduces the resistance inthe transistor current path and reduces the contact resistance of thedrain plug. Drain region 1114 can be formed by forming a trench and thencarrying out a two-pass angled implant of N-type impurities beforefilling the trench with a the drain plug, e.g., metal.

FIG. 12 shows the implementation of a highly conductive plug 1234 (e.g.,metal) and an optional highly doped P-type collector region 1214 at thecollector terminal of an IGBT 1200 which is otherwise similar instructure to IGBT 700 in FIG. 7, in accordance with another exemplaryembodiment of the invention. FIG. 13 shows the implementation of ahighly conductive plug 1334 (e.g., metal) and a highly doped N-typeregion 1214 at the cathode terminal of a lateral diode 1300 which isotherwise similar in structure to the lateral diode 800 in FIG. 8, inaccordance with yet another exemplary embodiment of the invention. As inthe preceding embodiments, plug 1334 and N+ region 1314 help improve thediode on-resistance. The highly conductive plug may also be implementedin the schottky diode 900 in a similar manner to that shown in FIG.1300.

FIGS. 6-13 show a higher doped n-type layer (e.g., layer 604 in FIG. 6)over a lower doped n-type layer (e.g., layer 602 in FIG. 6). In onevariation of these structures, each of these two layers is epitaxiallyformed over a highly doped substrate. In another variation, the higherdoped n-type layer is an epitaxial layer, and the underlying lower dopedn-type layer may be a substrate. In yet another variation, the higherdoped n-type layer is formed by implanting and driving n-type dopantsinto the lightly doped n-type layer which itself can be an epitaxiallayer extending over a substrate or a substrate.

FIG. 14 shows an implementation of the self-biasing electrodes in MOSFET1400 using silicon on insulator (SOI) technology or buried dielectrictechnology. As shown, MOSFET 1400 is similar to that in FIG. 6 exceptthat the structure is formed over a dielectric layer 1440 (e.g.,comprising oxide). In one embodiment, silicon regions 1402 and 1404 areepitaxial layers sequentially formed over dielectric layer 1440. Inanother embodiment, drift region 1404 is formed by implanting anddriving dopants into epitaxially formed silicon region 1402. Wheredielectric layer 1440 is a buried dielectric, a conventionalsemiconductor substrate (not shown) underlies dielectric layer 1440.Implementation of the other lateral power devices disclosed herein(including lateral IGBT, lateral diode, and lateral schottky diode)using SOI or buried dielectric would be obvious to one skilled in theart in view of this disclosure.

FIG. 15 shows a variation of the FIG. 14 MOSFET wherein the lightlydoped silicon region 1402 in MOSFET 1400 is eliminated so that electrode1424 terminates in and electrically contacts drift region 1504. FIG. 16shows yet another variation wherein MOSFET 1600 is formed in a singlelayer of silicon 1604. Implementation of the other lateral devices withintegrated self-biasing electrodes in a manner similar to theembodiments shown in FIGS. 15 and 16 would be obvious to one skilled inthe art in view of this disclosure.

FIGS. 17A-17C show top layout views of three exemplary configurations ofthe self-biasing electrodes. In FIG. 17A, each electrode 1724A isinsulated from drift region 1704A by a dielectric layer 1726A. Theelectrodes in FIG. 17A are arranged in a staggered configuration similarto those in FIGS. 6-16. In FIG. 17B, a number of electrodes 1724B areplaced in a dielectric well 1726B extending along a row. FIG. 17C alsoshows electrodes 1724C arranged along rows, but each electrode islocally insulated from drift region 1704C by a dielectric layer 1726C.While the electrodes in FIGS. 17A-17C are square-shaped, they mayalternatively have many other shapes such as circular, hexagonal andoval.

Note that an LDD region may be incorporate in one or more of the variousembodiments disclosed herein in a similar manner to that described abovein connection with FIG. 6. Also, while FIGS. 6-16 show the trenchedelectrodes terminating at the upper surface of the drift region, inother embodiments of the lateral devices in FIGS. 6-16, the trenchedelectrodes are recessed in their respective trenches similar toelectrodes 324 in MOSFET 300.

The various lateral power MOSFET and IGBT embodiments shown anddescribed herein have planar gate structures, however implementing theself-biasing electrodes in lateral MOSFETs and IGBTs with trench gatestructures such as those disclosed in U.S. patent application Ser. No.10/269,126, filed Oct. 3, 2002, which disclosure is incorporated hereinby reference in its entirety, would be obvious to one skilled in thisart in view this disclosure. Similarly, implementing the self-biasingelectrodes in lateral MOSFETs and IGBTs with shielded gate structuressuch as those disclosed in U.S. patent application Ser. No. 10/951,259,filed Sep. 26, 2004, which disclosure is incorporated herein byreference in its entirety, would be obvious to one skilled in this artin view of this disclosure.

While the above provides a detailed description of various embodimentsof the invention, many alternatives, modifications, combinations andequivalents of these embodiments are possible. For example, while theexemplary lateral power device embodiments in FIGS. 6-16 incorporateself-biasing electrodes which make contact with an adjacent siliconregion along the bottom of the electrodes, modifying these lateral powerdevice embodiments or their obvious variants so that the electrodes makecontact to adjacent silicon region along their top (similar to thatshown in FIG. 2) would be obvious to one skilled in this art in view ofthis disclosure. Also, it is to be understood that all material typesprovided herein to describe various dimensions, doping concentrations,and different semiconducting or insulating layers are for illustrativepurposes only and not intended to be limiting. For example, the dopingpolarity of various silicon region and the self-biasing electrodes inthe embodiments described herein may be reversed to obtain the oppositepolarity type device of the particular embodiment. For these and otherreasons, therefore, the above description should not be taken aslimiting the scope of the invention, which is defined by the appendedclaims.

1. A schottky diode comprising: a drift region of a first conductivitytype; a lightly doped silicon region of the first conductivity type inthe drift region; a conductor layer over and in contact with the lightlydoped silicon region, the conductor layer forming a schottky contactwith the lightly doped silicon region; a highly doped silicon region ofthe first conductivity type in the drift region, the highly dopedsilicon region being laterally spaced from the lightly doped siliconregion such that upon biasing the schottky diode in a conducting state,a current flows laterally between the lightly doped silicon region andthe highly doped silicon region through the drift region; and aplurality of trenches extending into the drift region perpendicular tothe current flow, each trench having a dielectric layer lining at leasta portion of the trench sidewalls and at least one conductive electrode.2. The schottky diode of claim 1 wherein each conductive electrodeelectrically contacts the drift region along upper sidewalls of eachtrench.
 3. The schottky diode of claim 2 wherein the drift regionextends over a silicon region of the first conductivity type, thesilicon region having a higher doping concentration than the driftregion.
 4. The schottky diode of claim 1 wherein each conductiveelectrode electrically contacts the drift region along a bottom of eachtrench.
 5. The schottky diode of claim 1 wherein the drift regionextends over a silicon region, the silicon region having a lower dopingconcentration than a doping concentration of the drift region, whereinthe plurality of trenches extend through the drift region and terminatewithin the silicon region, the conductive electrode in each trenchelectrically contacting the silicon region along a bottom of eachtrench.
 6. The schottky diode of claim 5 wherein the silicon regionextends over a dielectric layer.
 7. The schottky diode of claim 1wherein the drift region extends over a dielectric layer.
 8. Theschottky diode of claim 1 wherein each conductive electrode is of asecond conductivity type.
 9. The schottky diode of claim 1 wherein theplurality of electrodes are located between the lightly doped siliconregion and the highly doped silicon region in a staggered configuration.10. The schottky diode of claim 1 further comprising a highly conductiveplug extending into the highly doped silicon region.
 11. The schottkydiode of claim 10 wherein the highly conductive plug and the pluralityof trenches extend to substantially the same depth.
 12. A method offorming a schottky diode, comprising: a lightly doped silicon region ofa first conductivity type in a drift region of the first conductivitytype; forming a conductor layer over and in contact with the lightlydoped silicon region, the conductor layer forming a schottky contactwith the lightly doped silicon region; forming a highly doped siliconregion of the first conductivity type in the drift region, the highlydoped silicon region being laterally spaced from the lightly dopedsilicon region such that upon biasing the schottky diode in a conductingstate, a current flows laterally between the lightly doped siliconregion and the highly doped silicon region through the drift region;forming a plurality of trenches extending into the drift regionperpendicular to the current flow; forming a dielectric layer lining atleast a portion of each trench sidewalls; and forming at least oneconductive electrode in each trench.
 13. The method of claim 12 whereinthe dielectric layer is formed such that each conductive electrodeelectrically contacts the drift region along upper sidewalls of eachtrench.
 14. The method of claim 13 further comprising forming anepitaxial layer over a substrate of the first conductivity type, theepitaxial layer forming the drift region, and the substrate having ahigher doping concentration than the drift region.
 15. The method ofclaim 12 wherein the dielectric layer is formed such that eachconductive electrode electrically contacts the drift region along abottom of each trench.
 16. The method of claim 12 wherein the step offorming at least one conductive electrode comprises forming apolysilicon layer filling the plurality of trenches, the polysiliconlayer being in-situ doped to have a second conductivity type.
 17. Asemiconductor diode comprising: a semiconductor region of a firstconductivity type; an anode region of a second conductivity type in thesemiconductor region, the anode region and the semiconductor regionforming a pn junction therebetween; a first highly doped silicon regionof the first conductivity type in the semiconductor region, the firsthighly doped silicon region being laterally spaced from the anode regionsuch that upon biasing the semiconductor diode in a conducting state, acurrent flows laterally between the anode region and the first highlydoped silicon region through the semiconductor region; and a pluralityof trenches extending into the semiconductor region perpendicular to thecurrent flow, each trench having a dielectric layer lining at least aportion of the trench sidewalls and at least one conductive electrode,wherein each conductive electrode electrically contacts thesemiconductor region along a bottom of each trench.
 18. Thesemiconductor diode of claim 17 wherein the semiconductor regioncomprises a drift region of the first conductivity type extending over asecond silicon region of the first conductivity type, the second siliconregion having a higher doping concentration than the drift region. 19.The semiconductor diode of claim 17 wherein the semiconductor regioncomprises a drift region of the first conductivity type extending over asecond silicon region of the first conductivity type, the second siliconregion having a lower doping concentration than the drift region,wherein the plurality of trenches extend through the drift region andterminate within the second silicon region, the conductive electrode ineach trench electrically contacting the second silicon region along abottom of each trench.
 20. The semiconductor diode of claim 19 whereinthe second silicon region extends over a second dielectric layer. 21.The semiconductor diode of claim 17 wherein the semiconductor regionextends over a second dielectric layer.
 22. The semiconductor diode ofclaim 17 wherein each conductive electrode is of a second conductivitytype.
 23. The semiconductor diode of claim 17 wherein the plurality oftrenches are located between the anode region and the first highly dopedsilicon region in a staggered configuration.
 24. The semiconductor diodeof claim 17 further comprising a highly conductive plug extending intothe first highly doped silicon region.
 25. The semiconductor diode ofclaim 24 wherein the highly conductive plug and the plurality oftrenches extend to substantially the same depth.
 26. A method of forminga semiconductor diode comprising: forming an anode region in asemiconductor region of a first conductivity type, the anode regionbeing of a second conductivity type, the anode region and thesemiconductor region forming a pn junction therebetween; forming a firsthighly doped silicon region of the first conductivity type in thesemiconductor region, the first highly doped silicon region beinglaterally spaced from the anode region such that upon biasing thesemiconductor diode in a conducting state, a current flows laterallybetween the anode region and the first highly doped silicon regionthrough the semiconductor region; forming a plurality of trenchesextending into the semiconductor region perpendicular to the currentflow; forming a dielectric layer lining at least a portion of eachtrench sidewalls; and forming at least one conductive electrode in eachtrench, wherein the dielectric layer is formed such that each conductiveelectrode electrically contacts the semiconductor region along a bottomof each trench.
 27. The method of claim 26 further comprising formingthe semiconductor region of the first conductivity type over a substrateof the first conductivity type, the substrate having a higher dopingconcentration than the semiconductor region.
 28. The method of claim 26wherein the step of forming at least one conductive electrode comprisesforming a polysilicon layer filling the plurality of trenches, thepolysilicon layer being in-situ doped to have a second conductivitytype.
 29. The method of claim 26 further comprising forming thesemiconductor region of the first conductivity type over a substrate ofthe first conductivity type, the substrate having a lower dopingconcentration than the semiconductor region.